渐变组分背势垒GaN HEMT器件特性研究

    A Study on the Characteristics of Graded Composition Back-barrier GaN HEMT Devices

    • 摘要: 高频氮化镓微波功率器件的短沟道效应是限制其射频性能的重要原因,通常采用背势垒结构来提高二维电子气的限域性,抑制短沟道效应。然而背势垒层的加入会增加寄生电阻与栅极电容,使电流增益截止频率ft与最大震荡频率fmax降低。因此,本文采用了一种铝组分渐变的铝氮化镓背势垒结构,在一定程度上提高了器件的ftfmax。研究结果表明:与组分为0.05的固定组分背势垒相比,0~0.1渐变组分背势垒器件的最大震荡频率fmax最高提升了11.1 GHz,达到150.9 GHz。其射频功率特性也得到了明显改善,当工作频率为8 GHz时,最大输出功率密度达到5.2 W/mm,功率增益达到14.8 dB,功率附加效率达到了30.3%。

       

      Abstract: The short channel effect of high-frequency gallium nitride microwave power devices is an important reason that limits their radio frequency performance. The back-barrier structure is usually used to improve the confinement of the two-dimensional electron gas and suppress the short channel effect. However, the addition of a back-barrier layer will increase Parasitic resistance and gate capacitance which reduce the cut-off frequency ft and maximum oscillation frequency fmax. Therefore, a graded aluminum component aluminum gallium nitride back-barrier structure is adopted, which improves the ft and fmax to a certain extent. The results show that compared with the fixed component back-barrier, the fmaxof the gradient component back-barrier device has increased by 11.1 GHz to 150.9 GHz. Its radio freuqncy power characteristics have also been significantly improved. When the operating frequency is 8 GHz, the maximum power density reaches 5.2 W/mm, the power gain reaches 14.8 dB and the power added efficiency reaches 30.3%.

       

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